MoO₃ Ceramic Targets for Advanced Thin Film
Princeton Powder offers premium Molybdenum Oxide (MoO₃) ceramic sputtering targets designed for use in physical vapor deposition (PVD) processes such as magnetron sputtering. Our high-density MoO₃ targets deliver excellent stoichiometric control and uniform film deposition, making them ideal for optoelectronic devices, catalysts, and energy storage thin films.
Product Name: | Molybdenum Oxide Sputtering Target MoO3 |
CAS#: | 1313-27-5 |
Molar Mass: | 143.95 g/mol |
Density: | 4.7 g/cm3 |
Melting Point: | 802 °C |
Shape: | Discs, Rectangle, Step, Plates, Sheets, Rods, Custom-Made |
Dimension: | Diameter (200mm), Length (300mm), Width (200mm), Thickness (1mm), Custom-Made |
Description of Molybdenum Oxide Sputtering Target
Princeton Powder provides high-quality Molybdenum Oxide (MoO₃) sputtering targets for both research and industrial applications at competitive prices. We offer customizable MoO₃ sputtering targets with varying purity levels, sizes, and densities to meet your specific thin-film deposition requirements.
Our Molybdenum Oxide sputtering targets feature:
- High purity and high density for consistent and reliable sputtering performance
- Low particle generation to minimize defects in thin films
- Uniform film thickness distribution ensuring smooth, defect-free coatings
- High utilization efficiency, maximizing material usage and reducing waste
These features make our MoO₃ targets ideal for applications in optoelectronics, solar cells, energy storage devices, and catalytic coatings. Trust Princeton Powder for premium ceramic sputtering targets that deliver superior film quality and durability.
Dimensions of Molybdenum Oxide (MoO₃) Ceramic Targets
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Molybdenum Oxide (MoO₃) sputtering targets Application
Molybdenum Oxide (MoO₃) sputtering targets are widely used in:
- Optoelectronics – Transparent conductive oxide layers, photodetectors, and sensors
- Energy Storage – Thin film battery electrodes and supercapacitors
- Catalysis – Coatings for catalytic converters and gas sensors
- Solar Cells – Hole transport layers in organic photovoltaic devices
- Smart Windows – Electrochromic coatings for energy-efficient glazing
Molybdenum Oxide (MoO₃) sputtering targets Scholar Articles
Growth and surface characterization of sputter-deposited molybdenum oxide thin films
Molybdenum oxide thin films were produced by magnetron sputtering using a molybdenum (Mo) target. The sputtering was performed in a reactive atmosphere of an argon–oxygen gas mixture under varying conditions of substrate temperature (Ts) and oxygen partial pressure (pO2). The effect of Ts and pO2 on the growth and microstructure of molybdenum oxide films was examined in detail using reflection high-energy electron diffraction (RHEED), Rutherford backscattering spectrometry (RBS), energy-dispersive X-ray spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) measurements. The analyses indicate that the effect of Ts and pO2 on the microstructure and phase of the grown molybdenum oxide thin films is remarkable.
Molybdenum Oxide (MoO₃) sputtering targets FAQ
What purity levels are available for MoO₃ targets?
Standard purity is ≥ 99.9%, with options for higher purities on request.
Can the target size be customized?
Yes, diameters, thicknesses, and shapes are customizable to fit your sputtering system.
What deposition methods are compatible with MoO₃ targets?
Suitable for DC, RF, and pulsed DC magnetron sputtering as well as thermal evaporation.
What applications benefit most from MoO₃ sputtering targets?
Optoelectronic devices, solar cells, energy storage thin films, and catalytic coatings.