Hafnium (Hf) Sputtering Target (PVD Coating)
Hafnium (Hf) Sputtering Target is a high-performance material used in various PVD (Physical Vapor Deposition) processes, including magnetron sputtering, for the fabrication of high-quality thin films. Manufactured from high-purity hafnium metal (up to 99.95%), these targets exhibit excellent thermal stability, low vapor pressure, and exceptional corrosion resistance, making them ideal for semiconductor, optical, and nuclear coating applications.
Princeton Powder offers customizable Hf sputtering targets in planar or rotary forms, compatible with DC, RF, and reactive sputtering systems. Standard shapes include circular, rectangular, disc, and tube configurations. All targets feature a uniform grain structure, high density, and can be bonded with various backing plates to ensure optimal thermal conductivity during operation.
Material | Hafnium Hf |
Color/Appearance | Gray Steel, Metallic |
Purity | 99.9%, 4N excluding Zr |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
| Density | 13.2 g/cm3 |
Melting Point | 2150.0 ℃ |
Dimensions | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Customized |
Thermal Conductivity | 23 W/m.K |
Z Ratio | 0.36 |
Description of Hafnium Hf Target
Hafnium Sputtering Target is widely used in semiconductor, optical coating, PVD (physical vapor deposition), and CVD (chemical vapor deposition) thin film applications. Princeton Powder is a trusted manufacturer and supplier of high-purity hafnium sputtering targets, offering custom sizes, competitive pricing, and technical support for advanced coating needs.
Dimensions of Hafnium Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Available Backing Plates
- Oxygen-free copper (OFHC)
- Molybdenum
- Titanium
- Aluminum
Hafnium Hf Sputtering Target Application
- Semiconductor and microelectronics fabrication
- Optical coatings (infrared and high-reflectivity surfaces)
- Hard coatings for cutting tools and aerospace
- Nuclear and high-temperature environments
Hafnium Sputtering Target Scholar Articles
Characterization of sputtered hafnium thin films for high quality factor microwave kinetic inductance detectors
Hafnium is an elemental superconductor which crystallizes in a hexagonal close packed structure, has a transition temperature , and has a high normal state resistivity around . In Microwave Kinetic Inductance Detectors (MKIDs), these properties are advantageous since they allow for creating detectors sensitive to optical and near infra-red radiation. In this work, we study how sputter conditions and especially the power applied to the target during the deposition, affect the hafnium , resistivity, stress, texture and preferred crystal orientation.
FAQ – Hafnium Sputtering Target
What is the typical purity of a hafnium sputtering target?
Standard purities range from 99.5% to 99.95%. Ultra-high purity grades are available upon request for semiconductor-grade applications.
Can I customize the size and shape of the target?
Yes. We offer full customization on diameter, thickness, shape (disc, square, rectangular), and bonding type to fit your sputtering system.
What bonding options are available?
Common bonding methods include indium bonding, silver epoxy, or diffusion bonding depending on the thermal and mechanical requirements.
Is hafnium target compatible with reactive sputtering?
Yes. Hf targets are frequently used in reactive sputtering to deposit HfO₂ or HfN films for dielectric or barrier layer applications.