ITO Sputtering Targets (Indium Tin Oxide)
Princeton Powder manufactures and supplies high-purity Indium Tin Oxide (ITO) sputtering targets for transparent conductive oxide (TCO) applications. ITO is the industry standard material for producing thin films that offer both excellent electrical conductivity and high optical transparency. Our ITO targets are engineered for stable sputtering performance and are available in planar and rotary target configurations for small-scale research or large-area industrial coating.
Material | In2O3 • SnO2 (90:10 wt%,) |
Color | Black |
Purity | 99.9%, 4N |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
| Relative density | more than 99.2% |
Resistance | 1 x 10-4 Oh-cm |
Coefficient of Thermal Expansion (CTE) | 8 x 10-6 / K |
Bonding | indium bonding to oxygen free copper backing plate |
Sputter | RF, DC |
Description of ITO Sputtering Targets (Indium Tin Oxide)
Indium Oxide/Tin Oxide (In₂O₃/SnO₂ 90/10 wt%), commonly known as ITO, is one of the most popular sputtering target materials used in the thin film industry due to its exceptional electrical conductivity and optical transparency. The standard 90/10 wt% ITO composition has a melting point of approximately 1,800°C and a density of 7.14 g/cm³.
ITO compounds vary in color from pale yellow to dark green or dark grey depending on the specific formulation. This material is typically evaporated or magnetron sputtered under vacuum to produce transparent conductive oxide (TCO) layers used in the manufacturing of liquid crystal displays (LCDs) and various optical coatings.
Thin films of ITO are widely applied in the development of sensors, touch panels, and as durable glass coatings for the automotive industry due to their high transparency and excellent conductivity.
Dimensions of ITO Sputtering Targets (Indium Tin Oxide)
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
ITO Sputtering Targets (Indium Tin Oxide) Application
ITO sputtering targets are essential in industries requiring transparent and conductive films, including:
- Flat Panel Displays (FPDs) – TFT-LCD, OLED, and plasma displays
- Touch Panels – Capacitive and resistive touchscreens
- Solar Cells – Transparent electrodes for thin-film PV modules
- Low-E Glass – Energy-efficient architectural and automotive glazing
- Electrochromic Devices – Smart windows and display panels
- Optoelectronic Devices – LEDs, sensors, and laser components
ITO vs. IZO vs. AZO
- ITO (Indium Tin Oxide) – Highest conductivity and transparency; widely adopted in commercial electronics.
- IZO (Indium Zinc Oxide) – Smoother surface and better low-temperature performance for flexible substrates.
- AZO (Aluminum-Doped Zinc Oxide) – Indium-free alternative, more cost-effective but slightly lower conductivity.
ITO Sputtering Targets (Indium Tin Oxide) Scholar Articles
Advanced indium-tin oxide ceramics for sputtering targets
Indium-tin oxide (ITO) ceramic sputtering targets are widely used in formation of electrically conductive transparent thin films for electrodes in flat panel displays, solar cells, antistatic films and others, and which are commonly produced by a conventional dc magnetron sputtering process. The ceramic targets should be of high purity with a uniform microcrystalline structure and should possess high density and high electrical conductivity. In the present work, the challenges of the ceramic composition (e.g. the ratio of In2O3 and SnO2) and manufacturing are considered; they include the use of high quality starting materials, particularly In2O3 powders with respect to purity, morphology and sinterability, manufacturing routes and sintering process. Positive experience in the development and manufacturing of ITO ceramic planar sputtering targets using in-house prepared In2O3 powders is reported. ITO ceramic tiles with areas up to 1500–1700 cm2 and densities of 99+% of TD are manufactured. Physical properties of the ITO ceramics and sputtered films have been studied.
ITO Sputtering Targets (Indium Tin Oxide) FAQ
What is the difference between AZO and ITO targets?
Both are transparent conductive oxides, but AZO is indium-free, making it more cost-effective and environmentally friendly compared to Indium Tin Oxide (ITO).
Can you adjust the Al doping content?
Yes, Al₂O₃ content is customizable from 0.5 to 5 wt% to achieve desired electrical and optical properties.
What deposition methods are compatible with AZO targets?
AZO targets are compatible with DC magnetron sputtering, RF sputtering, and pulsed DC sputtering.
How does purity affect film performance?
Higher purity minimizes defects and enhances both conductivity and transparency, especially important for high-end optoelectronic applications.
Do you offer rotary AZO targets for large-area coating?
Yes, rotary and bonded targets are available for architectural glass, PV modules, and display production.