Indium Zinc Oxide Sputtering Target IZO
Princeton Powder manufactures high purity Indium Zinc Oxide (IZO) sputtering targets for advanced thin-film deposition applications. Designed for transparent conductive oxide (TCO) layers, our IZO targets combine excellent electrical conductivity, high optical transmittance, and stable sputtering performance. Available in both planar and rotary target forms, IZO is widely used in the production of displays, touch panels, solar cells, and energy-efficient glass.
| Product Name | Indium Zinc Oxide Sputtering Target |
| Purity | IZO, 99.9%-99.99% |
| Shape | Discs, Plates, Column Targets, Custom-made |
| Dimensions | Round sputtering target: Diameter: <18”, Thickness: >0.04” Rectangular sputtering target: Length: <36”, Width: <12”, Thickness: >0.04” |
| Bonding | Indium |
Description of IZO sputtering targets
Princeton Powder supplies high-purity Indium Zinc Oxide (IZO) sputtering targets, also referred to as zinc-doped indium oxide targets, for producing high-performance transparent conductive coatings. Indium oxide doped with tin oxide (ITO) and Indium Zinc Oxide (IZO) are widely used in flat panel display technologies, including liquid crystal displays (LCDs), electroluminescent displays (ELDs), and electrochromic displays (ECDs), due to their excellent combination of electrical conductivity and optical transparency.
Dimensions of IZO Sputtering Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
IZO sputtering targets Application
IZO sputtering targets are used in industries where transparent conductivity and smooth thin-film deposition are critical:
- Flat Panel Displays (FPDs) – TFT-LCD and OLED
- Touch Panels – Capacitive and resistive touch screens
- Solar Cells – Front electrodes for thin-film PV modules
- Low-E Glass – Energy-saving architectural glazing
- Optoelectronics – LEDs, photodetectors, and optical sensors
Indium Zinc Oxide (IZO) Sputtering Target Scholar Articles
Preparation of ITO and IZO Thin Films by Using the Facing Targets Sputtering (FTS) Method
In study, for transparent conductive oxides (TCOs) we investigated the electrical and the optical properties of thin films of indium oxide (In2O3) doped with 10 wt.% tin oxide (SnO2) and of indium oxide (In2O3) doped with 10 wt.% zinc oxide thin films in facing targets sputtering (FTS) system. All thin films were prepared on the glass at room temperature and at various oxygen contents in the sputter gas. All as-deposited thin films were annealed at various temperatures in an air atmosphere. The electrical and the optical properties of the as-deposited thin films were investigated by using a four point probe, an UV/VIS spectrometer, an X-ray diffractometer (XRD), and a Hall Effect measurement. As a result, with increasing oxygen content in the sputter gas, the optical transmittance in the visible range of all thin films increased (>80 %). ITO and IZO thin films had resistivities of 6.7 × 10−4 Ω·cm and 4.5 × 10−4 Ω·cm respectively at the optimum oxygen contents. After post-annealing, the structure of ITO thin film was polycrystalline, but the IZO thin films had amorphous.
Indium Zinc Oxide (IZO) Sputtering Targets FAQ
What is the typical ZnO content in IZO targets?
Most IZO targets contain 5–15 wt% ZnO, but composition can be customized for specific conductivity and transparency needs.
Can IZO replace ITO in all applications?
In many cases, yes—especially when smoother surface morphology or low-temperature deposition is required. However, application-specific testing is recommended.
What deposition methods are compatible with IZO targets?
IZO is compatible with DC, RF, and pulsed DC magnetron sputtering systems.
Do you offer bonded IZO targets?
Yes, bonded targets with Cu, stainless steel, or other backing plates are available.