CeO₂ Ceramic Targets for Advanced Thin Film Deposition
Princeton Powder offers premium Cerium Oxide (CeO₂) ceramic sputtering targets engineered for physical vapor deposition (PVD) methods such as magnetron sputtering. Our high-density CeO₂ targets deliver excellent stoichiometric control and uniform thin-film coatings, making them ideal for applications in electronics, optics, catalysis, and energy materials.
Material | Cerium Oxide (CeO₂) sputtering targets |
Manufacturing | High-temperature sintering and hot pressing |
Purity | 99.9%, 4N |
Shape | Ceramic sputtering targets (planar, custom shapes available) |
| Density | ≥ 98% theoretical density |
Surface Finish | Fine ground, sputter-ready |
Sizes | Custom diameters from 2” to 8” |
Bonding | With/No Bonding, or customized |
Backing Material | Molybdenum Or oxide free Copper |
Description of Cerium Oxide (CeO₂) Ceramic Sputtering Target
Cerium is a member of the lanthanide series and is the most abundant of the rare-earth elements found in the earth’s crust. Due to its exceptional properties, cerium oxide (CeO₂) is widely utilized in various optical and electronic applications, thanks to its high refractive index and elevated dielectric constant. Additionally, cerium oxide serves as an effective, environmentally friendly alternative to chromate-based coatings for corrosion protection, making it a preferred material in advanced protective coatings industries.
Dimensions of Cerium Oxide (CeO₂) Ceramic Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Cerium Oxide (CeO₂) Target Application
Cerium Oxide (CeO₂) sputtering targets are widely used in:
- Electronics – High-k dielectrics and gate oxide layers
- Optical Coatings – Anti-reflective and UV protective layers
- Catalysis – Catalyst coatings for automotive and industrial exhaust systems
- Energy Storage – Solid oxide fuel cells (SOFC) and battery components
- Protective Coatings – Wear-resistant and corrosion-resistant films
Cerium Oxide (CeO₂) Ceramic Sputtering Target Scholar Articles
RF Sputtered CeO2 Thin Films-Based Oxygen Sensors
In this paper, we report the scalable, high sensitivity, fast response, and low operating temperature Cerium oxide (CeO2) thin film-based oxygen sensors by optimizing CeO2 film thickness. CeO2 thin films of thickness ranging from 90 to 340 nm have been deposited at 400°C using radio frequency (RF) magnetron sputtering on Al2O3 substrates. Ellipsometry, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) have been used to characterize the CeO2 films for their thickness, structural, compositional/chemical, and surface morphology properties.
Cerium Oxide (CeO₂) Ceramic Sputtering Target FAQ
What purity grades are available for CeO₂ targets?
Standard purity is ≥ 99.9%, with higher purities available upon request.
Can target sizes be customized?
Yes, we provide custom diameters, thicknesses, and shapes to fit your sputtering system.
What deposition methods are suitable for CeO₂ targets?
Compatible with DC, RF, and pulsed DC magnetron sputtering as well as evaporation.
What industries commonly use CeO₂ sputtering targets?
Electronics, optics, catalysis, energy storage, and protective coatings industries.