Aluminum-doped Zinc Oxide (AZO) Ceramic target
Princeton Powder specializes in manufacturing high purity Aluminum-Doped Zinc Oxide (AZO) Ceramic Sputtering Targets for advanced thin-film deposition processes, including PVD (Physical Vapor Deposition) and magnetron sputtering. Our AZO targets are engineered for optimal performance in transparent conductive oxide (TCO) applications, delivering high conductivity, excellent optical transmittance, and stable sputtering behavior.
| Material Type | Alumina doped Zinc Oxide |
| Symbol | Al2O3/ZnO 2/98 wt%, AZO |
| Color/Appearance | Solid in various forms |
| Melting Point (°C) | N/A |
| Theoretical Density (g/cc) | 5.56 |
| Z Ratio | |
| Sputter | RF-R |
| Max Power Density (Watts/Square Inch) | 20 |
| Type of Bond | Indium |
Description of Aluminum-doped Zinc Oxide Sputtering Target
The standard copper (Cu) backing plate thickness for Aluminum-Doped Zinc Oxide (AZO) sputtering targets is 0.125 inch (3.175 mm). If a different thickness is required, please specify it when placing your order. High-density, fine-grained Alumina-Doped Zinc Oxide (AZO) sputtering targets, with a minimum purity of 99.9%, are available from Princeton Powder for high-performance PVD and magnetron sputtering applications. Both standard dimensions and customized sizes are available upon request to meet specific coating requirements.
Dimensions of AZO Sputtering Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
AZO ceramic sputtering targets Application
Our AZO ceramic sputtering targets are widely used in industries requiring transparent conductive coatings and energy-efficient films, including:
- Solar Cells – Transparent front electrode for thin-film photovoltaic modules (CIGS, CdTe, a-Si).
- Flat Panel Displays (FPDs) – TFT-LCD and OLED displays.
- Touch Screens – Conductive, transparent layers for capacitive and resistive touch panels.
- Low-Emissivity (Low-E) Glass – Energy-saving architectural and automotive glass.
- Optoelectronics – Light-emitting devices and photodetectors.
AZO Sputtering Target Scholar Articles
Comparative study of the sintering process and thin film sputtering of AZO, GZO and AGZO ceramics targets
Aluminum doped ZnO (AZO) and gallium doped ZnO (GZO) are most popular transparent conductive oxide materials, and aluminum-gallium co-doped ZnO (AGZO) has potential to be superior to AZO and GZO in various properties. In order to clarify their differences, we have studied the whole manufacture process, including powder production, target sintering and thin film sputtering. The morphologies, densification, structural and electrical properties of sintered targets were comparatively investigated. To verify the qualities of thin films, the most conductive targets were applied for magnetron sputtering, and the electrical and optical properties of thin films were characterized and analyzed in detail.
AZO Sputtering Target FAQ
What is the difference between AZO and ITO targets?
Both are transparent conductive oxides, but AZO is indium-free, making it more cost-effective and environmentally friendly compared to Indium Tin Oxide (ITO).
Can you adjust the Al doping content?
Yes, Al₂O₃ content is customizable from 0.5 to 5 wt% to achieve desired electrical and optical properties.
What deposition methods are compatible with AZO targets?
AZO targets are compatible with DC magnetron sputtering, RF sputtering, and pulsed DC sputtering.