Hafnium Nitride Sputtering Target (For PVD thin film coating)
Hafnium Nitride (HfN) Sputtering Target is a high-performance ceramic target material used in advanced PVD (physical vapor deposition) applications for hard coatings, diffusion barriers, and semiconductor thin films. HfN combines excellent hardness, thermal stability, and electrical conductivity, making it suitable for deposition of durable, conductive, and wear-resistant coatings on metals, semiconductors, and optical substrates.
Princeton Powder supplies high-purity HfN sputtering targets with customizable diameters, thicknesses, and bonding configurations. These targets are fabricated through advanced ceramic processing and hot pressing or sintering methods to ensure high density, uniform grain distribution, and low impurity content, optimizing thin film quality in magnetron sputtering systems.
Material | Hafnium Nitride sputtering targets |
Product Code | HF022 |
Color/Appearance | Yellow-Brown, Crystalline Solid |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
| Density | 13.8 g/cm3 |
Melting Point | 3305 ℃ |
Dimensions | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Customized |
Bonding | With/No Bonding, or customized |
Type of Bond | Indium |
Description of Hafnium Nitride Sputtering Target
Hafnium nitride (HfN or HfNx) thin film coatings are deposited using high-rate reactive sputtering in an argon-nitrogen (Ar/N₂) atmosphere, with tunable nitrogen content influencing the film’s color—from pale yellow to deep golden hues. Princeton Powder specializes in supplying high-purity Hafnium Nitride Sputtering Targets, engineered for maximum density, ultra-fine grain size, and consistent performance in advanced PVD coating and semiconductor applications.
Dimensions of Hafnium Nitride Sputtering Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Available Bonding Options
- Indium bonding for thermal conductivity
- Silver epoxy bonding for strong adhesion
- Diffusion bonding for high-power sputtering environments
- Compatible backing plates: OFHC copper, titanium, molybdenum, aluminum
Hafnium Nitride Ceramic Target Application
- Semiconductor Devices: Gate Electrodes, Diffusion Barrier Layers, and High-k Dielectric
- Optical & IR Coatings: IR Reflective Coating and AR/Absorber Layers
- Hard and Wear-Resistant Coatings: Cutting Tools & Dies and High-Temperature Parts
- Thin Conductive Ceramic Films
- Aerospace & Protection Coatings: Corrosion Protection Coatings and Thermal Barrier Systems
Hafnium Nitride Sputtering Target Scholar Articles
Evaluation of hafnium nitride thin films sputtered from a hafnium nitride target
Abstract: Hafnium nitride (HfN) thin films were prepared on Si (100) substrates by radio frequency magnetron sputtering with a compound target. Nitrogen composition, work function and electrical resistivity were investigated to evaluate thin film properties. Nitrogen composition and work function had little dependence on argon gas pressure and radio frequency power. Electrical resistivity showed strong correlation with the substrate temperature. When thin films were fabricated at room temperature, the electrical resistivity was 100 μΩ cm, and it became lower with an increase in the substrate temperature. When the films were fabricated at 600 °C, the resistivity became less than 50 μΩ cm.
Hafnium Nitride Sputtering Target FAQ
Can HfN be used for conductive coatings?
Yes. HfN is a conductive ceramic with metallic properties, commonly used for electrical contacts, gate electrodes, and conductive hard coatings.
What sputtering systems are compatible with HfN targets?
HfN targets are compatible with DC, RF, and magnetron sputtering systems, particularly in nitrogen-rich or inert atmospheres.
Can you provide custom sizes and bonding?
Yes. We offer customized HfN target sizes, thicknesses, and bonding options such as indium bonding, silver epoxy, or diffusion bonding to fit your deposition system.
What are the key advantages of HfN coatings?
Hafnium nitride coatings exhibit exceptional hardness, chemical stability, oxidation resistance, and electrical conductivity, making them ideal for semiconductors, cutting tools, and optical components.
What are the properties of a hafnium thin film produced from HfN sputtering?
Hafnium thin films deposited via HfN sputtering are typically dense, uniform, and exhibit excellent thermal and chemical stability. These films are used in barrier layers, high-temperature microelectronic structures, and sometimes undergo post-deposition nitridation to fine-tune electrical or mechanical properties.