Tantalum Pentoxide Sputtering Target ( For CVD and PVD application)
Princeton Powder is a global supplier of Tantalum Oxide (Ta2O5) sputtering targets with/no bonding. It is widely used to prepare tantalum oxide films for the semiconductor applications. The main semiconductor manufacturing process include chemical vapor deposition (CVD) and physical vapor deposition (PVD).
Tantalum Oxide sputtering targets can be applied for both direct current (DC) and radio frequency (RF) sputtering. Princeton Powder provide high purity 4N Tantalum Oxide sputtering targets with high flatness and an excellent surface finish. Copper or Molybdenum backing plate is available. Tantalum Oxide sputtering targets are for sale at a competitive price in the United States.
Material | Tantalum Oxide (Ta2O5) sputtering targets |
CAS Number | 1314-61-0 |
Purity | 99.9%, 4N |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
| Density | 8.2 g/cm3 |
Melting Point | 1872 ℃ |
Dimensions | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Customized |
Bonding | With/No Bonding, or customized |
Backing Material | Molybdenum Or Copper |
Description of Tantalum Oxide Sputtering Target
Tantalum Oxide, or Ta₂O₅, is an oxide compound of tantalum known for its high dielectric strength, transparency, and exceptional resistance to corrosion. Its unique properties make it ideal for optical coatings, dielectric layers in electronics, and protective films. Designed for precise thin-film applications, Ta₂O₅ sputtering targets offer controlled impurity levels and excellent surface flatness, ensuring reliable performance and uniformity in challenging conditions across industries.
Dimensions of Tantalum Oxide Sputtering Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Tantalum Oxide Sputtering Target Application
Optical Coatings: High-index and anti-reflective layers for lenses and displays.
Semiconductors: Dielectric layers in capacitors and gate insulators.
Protective Coatings: Corrosion-resistant layers for harsh environments.
Solar Cells: Efficiency-boosting layers in thin-film photovoltaics.
Optoelectronics: Stable dielectric layers for improved signal processing
Tantalum Oxide Sputtering Target Scholar Articles
Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering
Tantalum oxide thin films were prepared by using reactive dc magnetron sputtering in the mixed atmosphere of Ar and O2 with various flow ratios. The structure and O/Ta atom ratio of the thin films were analyzed by X-ray diffraction and X-ray photoelectron spectroscopy (XPS). The optical and dielectric properties of the Ta2O5 thin films were investigated by using ultraviolet–visible spectra, spectral ellipsometry and dielectric spectra.