Titanium disilicide TiSi2 Powder

Princeton Powder is a leading supplier of high-purity titanium disilicide powder. Our titanium disilicide powder features a purity of at least 99.5% and extremely low oxygen content. The particle size can be customized to meet specific application requirements, ensuring versatility for various high-performance materials and electronic applications. This high-quality powder is ideal for use in advanced technology fields where precision and material integrity are essential.

Our titanium disilicide powder is for sale at a competitive price in the USA.

Formula

Titanium disilicide TiSi2

CAS Number

12039-83-7

Purity

99.9% min

Synonyms

Titanium disilicide nano powder, Titanium disilicide microns powder, Titanium disilicide powder, Titanium silicide powder

Particle Sizes

-325 mesh or be customized

Appearance

Black Color

Melting Point

1470 °C

Oxygen Level

approx. 1,000-3,000 ppm

Density

>4.02g/cm3

Moh’s hardness

4-5

Titanium disilicide Powder low oxygen

Description of Titanium disilicide Powder

Titanium disilicide powder is a high-purity material featuring a chemical composition of TiSi₂, known for its exceptional thermal and electrical conductivity. It is characterized by a purity of over 99.5% and extremely low oxygen content, ensuring high performance in demanding applications. The powder can be customized in particle size to meet specific needs, making it suitable for advanced materials and electronic components. Its stability and conductivity make it ideal for use in semiconductor manufacturing, high-performance coatings, and other high-tech industries.

Chemical Composition of Titanium disilicide Powder

Product

Purity (%)

Particle Size D50 (μm)

Chemical Composition (%)

Si

O

N

C

TiSi2-1

>99

0.5-1.0

51.3~54.0

≤1.0

≤0.05

≤0.05

TiSi2-2

>99.5

1.0-3.0

51.3~54.0

≤0.8

≤0.05

≤0.05

TiSi2-3

>99.9

-325mesh

51.3~54.0

≤0.3

≤0.05

≤0.05

Particle Size distribution Titanium disilicide Powder

0.5-1.0 μm, 1.0-3.0 μm, -325 mesh Titanium disilicide Powder is available (Various particle sizes can be customized)

Application of Titanium disilicide Powder

Titanium disilicide powder is widely used in the production of high-performance materials and electronic components due to its excellent thermal stability and electrical conductivity. It is particularly valuable in applications such as semiconductor manufacturing, where its properties enhance the reliability and performance of electronic devices.

Titanium disilicide Powder Reference

Nanostructured titanium disilicide powders: Preparation by self-propagating high-temperature synthesis and mechanochemical processes and physicochemical properties

  • Nanostructured titanium disilicide (TiSi2) powders with semiconducting properties have been prepared via cold fusion of silicon and titanium nanopowders and mechanochemical activation of TiSi2 powders prepared by self-propagating high-temperature synthesis. The semiconducting properties of TiSi2 have been shown to be determined by the nanocrystallite size.