Vanadium Carbide Sputtering Target ( For thin film coating)
Princeton Powder supplies high-purity Vanadium Carbide sputtering targets with excellent flatness and surface finish, ensuring high-quality deposition. These targets are available with or without bonding, and optional copper or molybdenum backing plates can be provided for improved thermal conductivity and mechanical stability.
|
Material |
Vanadium Carbide Sputtering Target |
|
CAS Number |
12070-10-9 |
|
Purity |
99.9%, 4N |
|
Shape |
Discs, Plates, Column Targets, Step Targets, Custom-made |
| Density |
5.77 g/cm3 |
|
Melting Point |
2810 ℃ |
|
Dimensions |
Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Customized |
|
Bonding |
With/No Bonding, or customized |
|
Backing Material |
Molybdenum Or Copper |
Description of Vanadium Carbide Sputtering Target
Vanadium Carbide (VC) sputtering targets are high-performance materials used to produce thin films that offer exceptional hardness, wear resistance, and thermal stability. These properties make VC films ideal for applications in cutting tools, wear-resistant coatings, and electronic components, where durability and performance under harsh conditions are crucial.
VC sputtering targets are typically used in physical vapor deposition (PVD) and chemical vapor deposition (CVD) processes, including both direct current (DC) and radio frequency (RF) sputtering. The resulting VC thin films are widely applied in industries such as aerospace, automotive, and manufacturing, where they enhance the longevity and functionality of components exposed to high wear and temperature.
Dimensions of Vanadium Carbide Sputtering Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Vanadium Carbide Sputtering Target Application
-
Aerospace Components: VC coatings provide additional protection for aerospace engine parts, turbine blades, and other high-temperature, high-pressure components, preventing wear and thermal damage, thus extending their service life.
-
Semiconductor Devices: VC films are used in electrodes and interconnects in integrated circuits and microelectronic devices, offering high hardness and excellent thermal stability, ensuring long-term reliability in high-temperature environments.
-
Tooling and Molding Dies: VC coatings are applied to tooling and molding dies, especially in high-strength operations such as plastic injection molding and metal casting, increasing tool durability and lifespan.
-
Magnetic and Superconducting Materials: VC films are used in specific magnetic and superconducting materials to improve their mechanical properties and wear resistance, particularly in applications requiring extremely high hardness and low friction.
- Cutting Tools and Industrial Machinery Coatings: VC films are applied to coat cutting tools, milling cutters, and drill bits, enhancing their wear resistance and durability, especially in high-strength tasks such as metalworking and stone cutting.
Vanadium Carbide Sputtering Target Scholar Articles
Deposition of vanadium carbide thin films using compound target sputtering and their field emission
Vanadium carbide (VC) thin films were deposited on silicon substrates by direct sputtering of a VC target in an argon atmosphere. The structure, composition, and electrical properties of the films were investigated as functions of deposition conditions. The crystallographic structure of the film was strongly related to the argon pressure. VC films with (111) preferred orientation were formed at 2.0 Pa regardless of the substrate temperature examined, while amorphous films were obtained at the lowest pressure of 0.5 Pa. It was shown that carbon segregation within the film was difficult to avoid, but could be suppressed to some degree. To make a full understanding of the compositional variation in compound target sputtering process, deposition of chromium carbide thin films was also performed. Some common mechanisms involved in compound target sputtering process were discussed. Field emission measurements revealed that the VC film is a good electron emitter.