Tantalum Disilicide powder ( irregular, -325mesh)
Princeton Powder is a leading manufacturer of tantalum disilicide particles, offering irregular powder shape of 15-53 µm. Our tantalum disilicide powder is widely used in various applications, including heating elements, electrodes and components in semiconductor manufacturing, high-temperature ceramic components and coatings.
We provide a wide range of Tantalum powder products including Tantalum Carbide (TaC) Powder, Tantalum Nitride (TaN) Powder, Tantalum Boride Powder, and Tantalum Oxide powder. Our tantalum disilicide powder is for sale in the United States, Canada, and Europe.
Formula | Tantalum Disilicide, TaSi2 |
CAS Number | 12039-79-1 |
Purity | 99.0% min |
Synonyms | Tantalum Disilicide Micron powder, Tantalum Disilicide Nanopowder |
Particle Sizes | 325 mesh or be customized |
Appearance | Black Color |
Melting Point | 2200°C |
Boiling Point | n/a |
Density | 9.14 g/cm3 |
| Morphology | Irregular |
Description of Tantalum Disilicide powder
Tantalum Disilicide (TaSi₂) powder is a black gray, refractory ceramic powder, which has super high temperature stability and excellent electrical conductivity. With a melting point of approximately 2200°C, Tantalum Disilicide maintains structural integrity in extreme environments. It is ideal for high-temperature applications. Tantalum Disilicide (TaSi₂) irregular powder, typically with a particle size of -325 mesh, has a minimum purity of 99%, ensuring consistency and performance in specialized applications.
Tantalum Disilicide is used to manufacture heating elements, electrical contacts, and components in semiconductor devices, where both electrical conductivity and thermal resistance are crucial. Additionally, Tantalum Disilicide is frequently utilized in the ceramics industry for producing coatings and components with enhanced durability.
Chemical Composition of Tantalum Disilicide powder
| Product | Purity (%) | Particle Size D50 (μm) | Chemical Composition (%) | |||
Si | O | N | C | |||
TaSi2-1 | >99.0 | 0.5-1.0 | 22.5~23.7 | ≤1.0 | ≤0.05 | ≤0.05 |
TaSi2-2 | >99.5 | 1.0-3.0 | 22.5~23.7 | ≤0.8 | ≤0.05 | ≤0.05 |
TaSi2-3 | >99.9 | 10.0-60.0 | 22.5~23.7 | ≤0.5 | ≤0.05 | ≤0.05 |
TaSi2-4 | >99.9 | -100+325mesh | 22.5~23.7 | ≤0.3 | ≤0.05 | ≤0.05 |
Particle Size of Tantalum Disilicide powder
-325 mesh, can be customzied
Application
Tantalum Disilicide (TaSi₂) has a high melting point, making it suitable for extreme temperature applications such as heating elements for industrial furnace.
Tantalum Disilicide has excellent electrical conductivity, it is siutable for electrical and semiconductor components application.
Tantalum Disilicide has good thermal stability, it is widely used for ceramic components and coatings for enhanced durability.
High purity Tantalum Disilicide has superior thermal and corrosion resistance, making it suitable for high-performance applications in aerospace and defense components.
Reference
- As an important high-temperature structural material, tantalum disilicide (TaSi2) suffers from performance degradation associated with high temperature oxidation due to the poor oxygen diffusion barring effect of the mixed Ta2O5/SiO2 oxidation scale. In this work, silica coating was prepared on the surface of TaSi2 powder by a sol-gel method. The oxidation resistance was studied by thermogravimetric tests in non-isothermal oxidation and isothermal oxidation, as well as by oxidation treatment in a tube furnace at temperatures ranging from 800 °C to 1400 °C. The spectral emissivity of raw TaSi2, coated TaSi2 and the oxidized ones was compared and analyzed.