Molybdenum Disulfide Sputtering Target ( For CVD and PVD application)
Molybdenum Disulfide (MoS₂) sputtering targets are used to deposit thin films with excellent lubricating, anti-wear, and corrosion-resistant properties for aerospace, electronics, and optical coatings. MoS₂ targets are suitable for both DC and RF sputtering, as well as CVD and PVD deposition processes. Princeton Powder offers high-purity MoS₂ targets with excellent flatness and surface finish, available with or without bonding and optional copper or molybdenum backing plates. These targets are ideal for high-performance coatings in industries requiring low friction and high durability.
Molybdenum Disulfide (MoS₂) sputtering targets are for sale at a good price.
Material | Molybdenum Disulfide Sputtering Target |
CAS Number | 1317-33-5 |
Purity | 99.9% |
Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
| Density | 5.06g/cm3 |
Melting Point | 2375 ℃ |
Dimensions | Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Customized |
Bonding | With/No Bonding, or customized |
Backing Material | Molybdenum Or Copper |
Description of Molybdenum Disulfide Sputtering Target
Molybdenum Disulfide (MoS₂) sputtering targets are specialized materials used to deposit thin MoS₂ films, valued for their excellent lubricating, anti-wear, and corrosion-resistant properties. Manufactured using high-purity MoS₂ powder through powder metallurgy and hot pressing, these targets achieve a dense, uniform composition ideal for sputtering. In the sputtering process, MoS₂ atoms are ejected and deposited as a coating on a substrate, producing a thin film with low friction and high-temperature stability.
Dimensions of Molybdenum Disulfide Sputtering Target
Circular Sputtering Targets | Diameter | 1.0” 2.0” 3.0” 4.0” 5.0” 6.0” Customized |
Rectangular Sputtering Targets | Width x Length | 5” x 12” 5” x 15” 5” x 20” 5” x 22” 6” x 20” Customized |
Thickness can be customized (With/No Bonding) | 0.125”, 0.25”, Customized | |
Molybdenum Disulfide Sputtering Target Application
Solid Lubricant Coatings: lubrication for rocket engine valves and satellite gyroscopes.
Semiconductor and Electronics: MoS₂ films are used in thin-film transistors (TFTs) and field-effect transistors (FETs)
Optical Coatings: MoS₂ coatings protect lenses by providing high wear resistance and corrosion protection
- High-Temperature Bearing Coatings: In high-temperature industrial settings, like oil drilling or furnace bearings
Molybdenum Disulfide Sputtering Target Scholar Articles
Crystal structure and tribological properties of molybdenum disulfide films prepared by magnetron sputtering technology
Molybdenum disulfide (MoS2) is widely used in practice due to its excellent lubricating properties. However, research on the tribological properties of magnetron sputtering for depositing MoS2 films remains limited. Herein, the tribological properties of MoS2 films were investigated in detail through a series of characterization and friction coefficient tests. MoS2 films were deposited onto silicon substrates by magnetron sputtering under different radio-frequency powers (Prf). With increased Prf, the crystallinity of the films gradually increases, whereas the friction coefficient initially decreases and then increases. Prf also affects the chemical composition, surface morphology, and grain size of MoS2 films. At Prf = 300 W, the film surface is dense and smooth, the grain distribution is uniform. Moreover, the films have superior tribological properties and low friction coefficient, which can be attributed to the weak van der Waals force among MoS2 layers and the microscopic morphology of the films. All these results indicate that by reasonably controlling the preparation parameters, MoS2 films with excellent tribological properties can be prepared by magnetron sputtering.