Hafnium oxide powder (Microns and nano particles)

Princeton Powder is a leading supplier of hafnium oxide fine powder, offering particle sizes ranging from nanometer to micron meter. Our HfO2 powder, with good flow ability, is used in various applications, including optical coatings, nuclear control rods, and advanced ceramics for high-temperature environments.

We provide a wide range of Hafnium powder products including Spherical Hafnium Hf Powder, Hafnium Carbide (HfC) Powder, Hafnium Nitride Powder, Hafnium Disilicide HfSi2 Powder, and Hafnium Boride powder

Formula

Hafnium Oxide, HfO2

CAS Number

12055-23-1

Purity

99.9% -99.99% min

Synonyms

Hafnium Oxide nano powder, Hafnium Oxide spherical powders, Hafnium Oxide microns powder

Particle Sizes

325 mesh or be customized

Appearance

White Color

Melting Point

2758°C

Boiling Point:

5400°C

Density

9.68g/cm3

Shape

Spherical or irregular particle 

Description of Hafnium oxide powder

Hafnium oxide (HfO₂) powder is a white, crystalline substance known for its high melting point and exceptional thermal stability. It exhibits a high dielectric constant, making it an important material in the semiconductor industry, particularly in advanced transistors and gate oxides. HfO₂ is also utilized in optical coatings, offering anti-reflective properties and low absorption in UV and infrared regions. Additionally, its chemical inertness and thermal resistance make it suitable for applications in thermal barrier coatings and refractory materials. Furthermore, hafnium oxide is employed in the nuclear industry for control rods due to its effective neutron absorption properties.

Chemical Composition of Hafnium oxide powder

Product

Purity (%)

Impurities Content (ppm)

HfO2 (+ZrO2)

Fe

Si

Ca

Al

Mg

Na

Nb

Zr

Ti

Cr

Cd

Ni

99.9

450

143

200

46

20

48

47

910

<10

27

<10

<10

99.99

29

18

23

11

<10

<10

<10

1971

<10

<10

<10

<10

Particle Size

0.5 μm, -200 mesh, -325 mesh, nano size, or customized

Particle Size distribution

0.5 μm, -200 mesh, -325 mesh, nano size, or customized

Application


Hafnium oxide (HfO₂) powder is widely used in the semiconductor industry as a high-κ dielectric material in transistors and as a gate oxide to enhance performance and reduce leakage currents. It is also employed in optical coatings for lenses and mirrors due to its high refractive index and stability in UV and infrared light. Additionally, HfO₂ serves as a thermal barrier coating in aerospace applications, providing thermal insulation and resistance to high temperatures.

Reference

Studies on Optical and Electrical Properties of Hafnium Oxide Nanoparticles

  • In this paper, the synthesis and physico-chemical properties of hafnium oxide nanoparticles (HfO2 NPs) are analyzed and reported. The synthesis was carried out by the precipitation route by using hafnium tetrachloride (HfCl4) as precursor material with potassium hydroxide (KOH) dissolved in Millipore water. In the precipitation technique, the chemical reaction is comparatively simple, low-cost and non-toxic compared to other synthetic methods.